Evaluation of Load Variations Characteristic in Class-F
Amplifier <Abstract> A plasma power source used for semiconductor manufacturing or welding requires a high-frequency power source. However, the power source for plasma has a characteristic that the load fluctuates (load variations) during the plasma generation. In this study, the load variation characteristics of a class-F amplifier is evaluated. By applying the computer algorithm, the characteristics when the resistance component and reactance component fluctuate in the class-F amplifier are evaluated in terms of output power and efficiency. Also, the load variation characteristics when the input voltage is changed are researched similarly. |